Antireflection Structures for VIS and NIR on Arbitrarily Shaped Fused Silica Substrates with Colloidal Polystyrene Nanosphere Lithography

Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR str...

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Bibliographic Details
Published inMicromachines (Basel) Vol. 14; no. 6; p. 1204
Main Authors Schmelz, David, Jia, Guobin, Käsebier, Thomas, Plentz, Jonathan, Zeitner, Uwe Detlef
Format Journal Article
LanguageEnglish
Published Switzerland MDPI AG 07.06.2023
MDPI
Subjects
Adaptation
antireflection
Broadband
colloidal lithography
Colloiding
Ethanol
Fused silica
Hydrophobicity
Integrated circuit fabrication
Langmuir-Blodgett
Lithography
moth-eye nanostructures
Nanospheres
Plasma etching
Polystyrene
polystyrene nanospheres
Polystyrene resins
reactive ion etching
Self-assembly
Silica
Spheres
Substrates
Surfactants
Germany
colloidal lithography
fused silica lens
reactive ion etching
polystyrene nanospheres
moth-eye nanostructures
Langmuir-Blodgett
antireflection
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Summary:Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR structures on arbitrarily shaped fused silica substrates is presented and evaluated. Special emphasis is placed on the involved manufacturing steps in order to be able to produce tailored and effective structures. An improved Langmuir-Blodgett self-assembly lithography technique enabled the deposition of 200 nm PS spheres on curved surfaces, independent of shape or material-specific characteristics such as hydrophobicity. The AR structures were fabricated on planar fused silica wafers and aspherical planoconvex lenses. Broadband AR structures with losses (reflection + transmissive scattering) of <1% per surface in the spectral range of 750-2000 nm were produced. At the best performance level, losses were less than 0.5%, which corresponds to an improvement factor of 6.7 compared to unstructured reference substrates.
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ISSN:2072-666X
2072-666X
DOI:10.3390/mi14061204