Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a M...

Full description

Saved in:
Bibliographic Details
Published inAPL materials Vol. 3; no. 9; pp. 096106 - 096106-6
Main Authors Oguchi, Hiroyuki, Isobe, Shigehito, Kuwano, Hiroki, Shiraki, Susumu, Orimo, Shin-ichi, Hitosugi, Taro
Format Journal Article
LanguageEnglish
Published United States AIP Publishing LLC 01.09.2015
Subjects
ATOMIC FORCE MICROSCOPY
ENERGY BEAM DEPOSITION
EPITAXY
LASER RADIATION
LITHIUM HYDRIDES
MAGNESIUM OXIDES
MATERIALS SCIENCE
PULSED IRRADIATION
SUBSTRATES
SURFACES
THIN FILMS
Online AccessGet full text

Cover

More Information
Summary:We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250 °C under a hydrogen pressure of 1.3 × 10−2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.
ISSN:2166-532X
2166-532X
DOI:10.1063/1.4931080