CHEMICALLY AMPLIFIED RESISTS VII. PROTON GENERATION FROM TRIPHENYL SULFONIUM SALTS via PHOTOCHEMICAL ISOMERIZATION MECHANISM

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 8; no. 4; pp. 653 - 656
Main Authors OHMORI, NORIHITO, NAKAZONO, YOSHIKAZU, TSUJINO, AKIKO, HATA, MASAYUKI, OIKAWA, SETSUKO, TSUDA, MINORU
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1995
Japan Science and Technology Agency
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.8.653