Hybrid lithography: Combining UV-exposure and two photon direct laser writing
We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-...
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Published in | Optics express Vol. 21; no. 24; p. 29921 |
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Main Authors | , , , , , , |
Format | Journal Article |
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02.12.2013
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Abstract | We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated. |
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AbstractList | We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated.We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated. We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated. |
Author | Eschenbaum, Carsten Valouch, Sebastian Lemmer, Uli Großmann, Daniel Dopf, Katja Bocksrocker, Tobias Kettlitz, Siegfried |
Author_xml | – sequence: 1 givenname: Carsten surname: Eschenbaum fullname: Eschenbaum, Carsten – sequence: 2 givenname: Daniel surname: Großmann fullname: Großmann, Daniel – sequence: 3 givenname: Katja surname: Dopf fullname: Dopf, Katja – sequence: 4 givenname: Siegfried surname: Kettlitz fullname: Kettlitz, Siegfried – sequence: 5 givenname: Tobias surname: Bocksrocker fullname: Bocksrocker, Tobias – sequence: 6 givenname: Sebastian surname: Valouch fullname: Valouch, Sebastian – sequence: 7 givenname: Uli surname: Lemmer fullname: Lemmer, Uli |
BackLink | https://www.ncbi.nlm.nih.gov/pubmed/24514543$$D View this record in MEDLINE/PubMed |
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SubjectTerms | Equipment Design Equipment Failure Analysis Lenses Materials Testing Microfluidic Analytical Techniques - instrumentation Molecular Imprinting - methods Photography - methods Photons Polymers - chemistry Polymers - radiation effects Surface Properties - radiation effects Ultraviolet Rays |
Title | Hybrid lithography: Combining UV-exposure and two photon direct laser writing |
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