Hybrid lithography: Combining UV-exposure and two photon direct laser writing

We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-...

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Bibliographic Details
Published inOptics express Vol. 21; no. 24; p. 29921
Main Authors Eschenbaum, Carsten, Großmann, Daniel, Dopf, Katja, Kettlitz, Siegfried, Bocksrocker, Tobias, Valouch, Sebastian, Lemmer, Uli
Format Journal Article
LanguageEnglish
Published United States 02.12.2013
Subjects
Equipment Design
Equipment Failure Analysis
Lenses
Materials Testing
Microfluidic Analytical Techniques - instrumentation
Molecular Imprinting - methods
Photography - methods
Photons
Polymers - chemistry
Polymers - radiation effects
Surface Properties - radiation effects
Ultraviolet Rays
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Summary:We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated.
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ISSN:1094-4087
1094-4087
DOI:10.1364/OE.21.029921