Patterning thin polymer films by surface-directed dewetting and pattern transfer

The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and at...

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Bibliographic Details
Published inPolymer (Guilford) Vol. 44; no. 13; pp. 3737 - 3743
Main Authors Zhang, Zexin, Wang, Zhe, Xing, Rubo, Han, Yanchun
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 01.06.2003
Elsevier
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Summary:The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and atomic force microscopy images reveal that ordered micrometer scale pattern can be created by surface direct dewetting. Various pattern sizes and pattern complexities can be achieved by controlling the experimental parameters. The dewetting pattern has been transferred to form PDMS stamp for soft lithography.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0032-3861
1873-2291
DOI:10.1016/S0032-3861(03)00315-X