Electrodeposition of Cu/Ni–P multilayers by a single bath technique

• Published in: Thin solid films Vol. 397; no. 1; pp. 83 - 89
• Main Authors: Miyake, Takeshi, Kume, Michiyuki, Yamaguchi, Koichi, Amalnerkar, Dinesh P, Minoura, Hideki
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 01.10.2001; Elsevier Science
• Subjects: Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Cu/Ni–P; Electrodeposition; Electrodeposition, electroplating; Exact sciences and technology; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Multilayers; Nanostructure; Physics; Single bath; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Multilayers; Electrodeposition; Cu/Ni–P; Single bath; Nanostructure; Nickel base alloys; Crystallinity; Nanostructures; Phosphorus alloys; Experimental study; Thin films; Transition elements; Crystal growth from solutions; Chemical composition; Copper; TEM; Transition element alloys
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/S0040-6090(01)01359-1

Cu/Ni–P multilayers, comprised of alternatively formed ‘nano-size’ sublayers of Cu and Ni–P, have been successfully produced from a single bath using modulated (i.e. periodic pulse control) current density. The chemical composition and the crystallinity of resultant deposits are influenced by the deposition current density. Transmission electron microscopy (TEM) examination of our multilayer sample clearly showed the formation of alternative sublayers of Cu and Ni–P (thickness ∼50 nm). Electrolysis at a cathodic current density of 5 A/dm 2 yields a poorly crystallized Ni–P sublayer, while that at 10 A/dm 2 gives a crystalline one. Thus it is possible to obtain Cu/Ni–P multilayers with different crystallinity in the Ni–P sublayer by simply changing the cathodic current density.