Functionalization of fine particles using atomic and molecular layer deposition

• Published in: Powder technology Vol. 221; pp. 13 - 25
• Main Authors: King, David M., Liang, Xinhua, Weimer, Alan W.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.05.2012; Elsevier
• Subjects: Applied sciences; Atomic layer deposition; Chemical engineering; Exact sciences and technology; Fluidized bed reactor; fluidized beds; Functionalized particles; gases; metals; Miscellaneous; Molecular layer deposition; nanoparticles; nanotubes; oxides; Particle Coating; Passivated nanomaterial; process control; Reactors; Solid-solid systems; Fluidized bed reactor; Passivated nanomaterial; Particle Coating; Atomic layer deposition; Functionalized particles; Molecular layer deposition; Nanoparticle; Process control; Precursor; Continuous process; Refractory; Functionalization; Fine particle; Nanostructured materials
• ISSN: 0032-5910; 1873-328X
• DOI: 10.1016/j.powtec.2011.12.020

The functionalization of fine primary particles, including nanoparticles and nanotubes, is easily carried out using atomic or molecular layer deposition (ALD or MLD, respectively) techniques. Particle ALD/MLD can be used to deposit conformal and pinhole-free films of refractory oxides, non-oxides, metals, and hybrid polymer-based materials, amongst others. Fluidized bed reactors are well-suited for large scale operations and can be operated at reduced pressures while using inert gases necessary for standard self-limiting, flow-based ALD/MLD processes. The continuous-flow processing allows for process control using an in-line mass spectrometer downstream from the reactor chamber. Many insulating, semiconducting, metallic, polymeric and hybrid inorganic/organic films have been successfully deposited on primary particle surfaces in fluidized bed reactors using a variety of precursor types. This paper reviews some of the Particle ALD/MLD work carried out by the authors, including techniques and measurements used in Particle ALD/MLD. Some current and future applications of functionalized or passivated nanomaterials are also highlighted here. This paper is a review of the functionalization of fine primary particles, including nanoparticles, as carried out using atomic or molecular layer deposition (ALD or MLD, respectively). Particle ALD/MLD can be used to deposit conformal and pinhole-free films of refractory oxides, non-oxides, metals, and hybrid polymer-based materials, amongst others. Scalable fluidized bed reactors are well-suited for large scale ALD/MLD processing. [Display omitted]