Condensation coefficients in plasma sputtering deposition

Optical emission spectroscopy and Rutherford backscattering spectrometry are combined to determine condensation coefficients for plasma sputtering deposition. The method is applied for palladium deposition onto various substrates and condensation coefficients are found to lie between 0.4 and 0.9.

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 40; no. 7; pp. 2121 - 2123
Main Authors Brault, Pascal, Thomann, Anne-Lise, Rozenbaum, Jean-Philippe
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 07.04.2007
Institute of Physics
Subjects
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Engineering Sciences
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Plasmas
RBS
Palladium
Light emission
Growth rate
Sputter deposition
Plasma deposition
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Summary:Optical emission spectroscopy and Rutherford backscattering spectrometry are combined to determine condensation coefficients for plasma sputtering deposition. The method is applied for palladium deposition onto various substrates and condensation coefficients are found to lie between 0.4 and 0.9.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/40/7/039