Refractive Index and Transmittance Optimization of C-S-Au Film by Plasma Process

Carbon-sulfur-gold (C-S-Au) film was formed by co-operation process of plasma CVD and sputtering with using methane, SF6 and Ar mixture gas and gold plate discharge electrode. After optimization, 51% of transmittance at around 500nm and 3.5 of refractive index was realized at a gas flow rate of 10,...

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Published inJournal of Photopolymer Science and Technology Vol. 15; no. 2; pp. 317 - 321
Main Authors Kashem, Md. Abul, Matushita, Masaki, Morita, Shinzo
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.01.2002
Japan Science and Technology Agency
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Abstract Carbon-sulfur-gold (C-S-Au) film was formed by co-operation process of plasma CVD and sputtering with using methane, SF6 and Ar mixture gas and gold plate discharge electrode. After optimization, 51% of transmittance at around 500nm and 3.5 of refractive index was realized at a gas flow rate of 10, 10 and 15 SCCM for methane, SF6 and Ar respectively, a pressure of 0.1Torr and a discharge power of 100W. The large refractive index was referred to atomically distributed gold atom in the C-S-Au film.
AbstractList Carbon-sulfur-gold (C-S-Au) film was formed by co-operation process of plasma CVD and sputtering with using methane, SF6 and Ar mixture gas and gold plate discharge electrode. After optimization, 51% of transmittance at around 500nm and 3.5 of refractive index was realized at a gas flow rate of 10, 10 and 15 SCCM for methane, SF6 and Ar respectively, a pressure of 0.1Torr and a discharge power of 100W. The large refractive index was referred to atomically distributed gold atom in the C-S-Au film.
Author Matushita, Masaki
Kashem, Md. Abul
Morita, Shinzo
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References 1). M.D.B. Charlton, M.E. Zoorob and G.J. Parker, Mat. Sci. Eng. B, 74 (2000) pp.17-21.
7). M. Matsushita, Md. Zarid Bin Harum, Kashem, Md. Abul and S. Morita; J. Photoplolym. Sci. and Tech, 12 (1) (1999) pp.11-14.
4). L. Marutinu, Solar Energy Materials, 15 (1987) p.21.
8). For example; K. Ishikawa, T. Isonaga, S. Wakita, Y. Suzuki; Solid State Ionics, 79 (1995) pp.60-66
5). R. d'Agostino, Ed., "Plasma Deposition, Treatment, and Etching of Polymers", Academic Press, (1990).
3). H. Kosaka, T. Kawashima, A Tomita et. al., Phy. Rev. B 58 (16) (1998) pp.10096-10099.
6). M. Matsushita, Kashem, Md. Abul and S. Morita; J. Photoplolym. Sci. and Tech, 14 (1) (2001) pp.123-126.
2). D. Cassagne, C. Jouanin, and D. Bertho, Phy. Rev. B 53 (11) (1996) p.7134.
9). M. Matsushita, Kashem, Md. Abul and S. Morita; Printing in the Thin Solid films.
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SubjectTerms C-S-Au Film
Gold
Optical transmittance
Refractive Index
RF Plasma CVD
Sputtering
Title Refractive Index and Transmittance Optimization of C-S-Au Film by Plasma Process
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