Semiconductor/Polymer Nanocomposites of Acrylates and Nanocrystalline Silicon by Laser-Induced Thermal Polymerization

• Published in: Macromolecular materials and engineering Vol. 298; no. 11; pp. 1160 - 1165
• Main Authors: Deubel, Frank, Steenackers, Marin, Garrido, José A., Stutzmann, Martin, Jordan, Rainer
• Format: Journal Article
• Language: English
• Published: Weinheim WILEY-VCH Verlag 01.11.2013; WILEY‐VCH Verlag; Wiley; John Wiley & Sons, Inc
• Subjects: Acrylates; Applied sciences; Exact sciences and technology; nanocomposites; nanoparticles; patterning; photopolymerization; Physicochemistry of polymers; Polymerization; Polymers and radiations; silicon nanocrystals; Methacrylate polymer; Patterning; Bulk polymerization; Experimental study; nanocomposites; nanoparticles; Laser beam; Linear polymer; Photopolymerization; Morphology; Crosslinked polymer; Hydroxyethyl acrylate polymer; Nanocomposite; Silicon; Manufacturing; Photolithography; Nanocrystal; silicon nanocrystals
• ISSN: 1438-7492; 1439-2054
• DOI: 10.1002/mame.201200392

In this work, a novel method for the preparation of polymer/semiconductor nanocomposites is presented. The nanocomposite is directly prepared from a suspension of nanocrystalline silicon (nc‐Si) in bulk vinyl monomers (acrylates) and focused heating of the nc‐Si by irradiation with a pulsed laser at 532 nm wavelength. The silicon nanocrystals are the inorganic component of the composite and simultaneously act as initiation points of the free radical polymerization forming the hybrid composite. By this method, patterned nanocomposite films with thicknesses up to ≈250 µm can be readily prepared. Furthermore, the polymerization kinetics were investigated for different reaction conditions such as irradiation time, laser intensity, nc‐Si content, and addition of radical initiators. A new organic–inorganic nanocomposite is synthesized by laser‐induced thermal polymerization of acrylates. Silicon nanocrystals act as the inorganic component as well as hot‐spots initiating the thermal crosslinking reaction. The nanocomposite formation is confined to the irradiated areas and patterned composite film can be readily produced with a film thickness of up to 600 µm.