MECHANISM OF MORPHOLOGICAL TRANSFORMATIONS OF ION IMPLANTED RESISTS IN A DOWNSTREAM ASHER

A kinetics of surface transformations and ashing of high energy high dose As+ implanted resists was studied. Continuous bulk polymer structures, having minimum cross-sectional dimensions 10-30 times larger than the initial resist thickness, were found. These structures, named as giant folds, are for...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 11; no. 1; pp. 125 - 132
Main Authors Vinogradov, G.K., Menagarishvili, V.M., Yoneyama, S.
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1998
Japan Science and Technology Agency
Subjects
downstream ashing
inductive plasma source
ion implanted resist
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Summary:A kinetics of surface transformations and ashing of high energy high dose As+ implanted resists was studied. Continuous bulk polymer structures, having minimum cross-sectional dimensions 10-30 times larger than the initial resist thickness, were found. These structures, named as giant folds, are formed as a result of heating and melting of the normal polymer resist sub-layer and its interaction with a mechanically deformed implanted resist layer. The giant folds are responsible for the most difficult to remove surface remaining features of ion implanted resists processed in downstream gas discharge ashers. It is shown that the main problem of dry ashing of ion implanted resists of this type is accounted for the flow patterns of the normal resist sub-layer but not the hard implanted surface layer itself.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.11.125