Low pressure MOVPE growth and characterization of ZnTe homoepitaxial layers

• Published in: Physica status solidi. C Vol. 13; no. 7-9; pp. 439 - 442
• Main Authors: Nishio, Mitsuhiro, Saito, Katsuhiko, Abiru, Masakatsu, Mori, Eiichiro, Araki, Yasuhiro, Tanaka, Daichi, Tanaka, Tooru, Guo, Qixin
• Format: Journal Article
• Language: English
• Published: Berlin WILEY-VCH Verlag 01.07.2016; WILEY‐VCH Verlag; Wiley Subscription Services, Inc
• Subjects: Low pressure; Morphology; photoluminescence spectrum; reactor pressure; Reactors; Solid state physics; Substrates; Surface kinetics; surface morphology; Surface roughness; Zinc tellurides; ZnTe
• ISSN: 1862-6351; 1610-1642
• DOI: 10.1002/pssc.201510240

The growth rate and photoluminescence (PL) spectrum of ZnTe homoepitaxial layer grown at a reactor pressure of 500 Torr by metalorganic vapor phase epitaxy have been clarified as a function of substrate temperature. An optimum substrate temperature for obtaining ZnTe layers with better PL property is determined by taking into account the growth rate behavior. Furthermore, the growth rate, PL spectrum, surface roughness and surface morphology of ZnTe layer have also been investigated by varying reactor pressure. With increasing reactor pressure, both the PL property and surface roughness of ZnTe layer are improved and subsequently become degraded, according as the growth rate increases monotonically and then shows saturated tendency. Change in the surface morphology of ZnTe layer with the increase of reactor pressure resembles that with the decrease of substrate temperature, probably due to the change from mass‐transport regime to surface kinetics one. (© 2016 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)