Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography

An electron beam (EB) lithography method using inedible cellulose-based resist material derived from woody biomass has been successfully developed. This method allows the use of pure water in the development process instead of the conventionally used tetramethylammonium hydroxide and anisole. The in...

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Bibliographic Details
Published inAIP advances Vol. 5; no. 7; pp. 077141 - 077141-7
Main Authors Takei, Satoshi, Maki, Hirotaka, Sugahara, Kigen, Ito, Kenta, Hanabata, Makoto
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 01.07.2015
AIP Publishing LLC
Subjects
ANISOLE
BIOMASS
CELLULOSE
Disaccharides
Electron beam lithography
ELECTRON BEAMS
Film thickness
FOOD
HYDROXIDES
Hydroxyl groups
INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY
IRRADIATION
MASKING
PROCESSING
RADIATION DOSES
RADIATION EFFECTS
SACCHAROSE
SHRINKAGE
WATER
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Summary:An electron beam (EB) lithography method using inedible cellulose-based resist material derived from woody biomass has been successfully developed. This method allows the use of pure water in the development process instead of the conventionally used tetramethylammonium hydroxide and anisole. The inedible cellulose-based biomass resist material, as an alternative to alpha-linked disaccharides in sugar derivatives that compete with food supplies, was developed by replacing the hydroxyl groups in the beta-linked disaccharides with EB-sensitive 2-methacryloyloxyethyl groups. A 75 nm line and space pattern at an exposure dose of 19 μC/cm2, a resist thickness uniformity of less than 0.4 nm on a 200 mm wafer, and low film thickness shrinkage under EB irradiation were achieved with this inedible cellulose-based biomass resist material using a water-based development process.
ISSN:2158-3226
2158-3226
DOI:10.1063/1.4927210