The determination of high-density carrier plasma parameters in epitaxial layers, semi-insulating and heavily doped crystals of 4H-SiC by a picosecond four-wave mixing technique
We applied a picosecond four-wave mixing technique for measurements of carrier lifetimes and diffusion coefficients in highly excited epitaxial layers, semi-insulating and heavily doped 4H-SiC substrates. Optical carrier injection at two different wavelengths (266 and 355 nm) allowed us to vary the...
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Published in | Semiconductor science and technology Vol. 21; no. 7; pp. 952 - 958 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
01.07.2006
Institute of Physics |
Subjects | |
Online Access | Get full text |
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Summary: | We applied a picosecond four-wave mixing technique for measurements of carrier lifetimes and diffusion coefficients in highly excited epitaxial layers, semi-insulating and heavily doped 4H-SiC substrates. Optical carrier injection at two different wavelengths (266 and 355 nm) allowed us to vary the depth of the excited region from 1-2 νm to 50 νm, and thus determine photoelectric parameters of carrier plasma in the density range from 2 × 1016 to 1019 cm-3. Strong dependence of carrier lifetime and mobility on carrier density was found in the epitaxial layers. The origin of fast decay components, not resolved previously by photoluminescence and free-carrier absorption techniques in SiC, was attributed to nonlinear carrier recombination. Numerical modelling provided a value of bimolecular recombination coefficient equal to B ≤ (2-4) × 10-11 cm3 s-1 and verified a surface recombination velocity S ≤ 4 × 104 cm s-1. In heavily doped crystals, nonlinear carrier recombination reduced the carrier lifetime down to 1.1 ns, while in semi-insulating ones a lifetime of 1.5-2.5 ns was measured. Temperature dependences of four-wave mixing provided monopolar carrier mobility in heavily doped and bipolar one in semi-insulating crystals, and revealed the contribution of ionized impurity and phonon scattering mechanisms. © 2006 IOP Publishing Ltd. |
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ISSN: | 0268-1242 1361-6641 1361-6641 |
DOI: | 10.1088/0268-1242/21/7/021 |