Photochemical Reaction of Polymers Used as Resists by 146-nm Light Exposure

We studied the photochemical reaction of polymers used as resists by 146-nm light exposure. In methacrylate polymers, the main-chain scission was induced by the decomposition of the carbonyl moieties. In poly (hydroxystyrene)-type polymers, the polymer backbone was crosslinked. In norbornene carboxy...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 12; no. 5; pp. 717 - 720
Main Authors Kishimura, Shinji, Sasago, Masaru, Shirai, Masamitsu, Tsunooka, Masahiro
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1999
Japan Science and Technology Agency
Subjects
146nm
Kr2
resist
VUV
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Summary:We studied the photochemical reaction of polymers used as resists by 146-nm light exposure. In methacrylate polymers, the main-chain scission was induced by the decomposition of the carbonyl moieties. In poly (hydroxystyrene)-type polymers, the polymer backbone was crosslinked. In norbornene carboxylate polymers, the carbonyl moieties decomposed by 146-nm light and the crosslinking of the polymers occurred.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.12.717