Photochemical Reaction of Polymers Used as Resists by 146-nm Light Exposure
We studied the photochemical reaction of polymers used as resists by 146-nm light exposure. In methacrylate polymers, the main-chain scission was induced by the decomposition of the carbonyl moieties. In poly (hydroxystyrene)-type polymers, the polymer backbone was crosslinked. In norbornene carboxy...
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Published in | Journal of Photopolymer Science and Technology Vol. 12; no. 5; pp. 717 - 720 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Hiratsuka
The Society of Photopolymer Science and Technology(SPST)
1999
Japan Science and Technology Agency |
Subjects | |
Online Access | Get full text |
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Summary: | We studied the photochemical reaction of polymers used as resists by 146-nm light exposure. In methacrylate polymers, the main-chain scission was induced by the decomposition of the carbonyl moieties. In poly (hydroxystyrene)-type polymers, the polymer backbone was crosslinked. In norbornene carboxylate polymers, the carbonyl moieties decomposed by 146-nm light and the crosslinking of the polymers occurred. |
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ISSN: | 0914-9244 1349-6336 |
DOI: | 10.2494/photopolymer.12.717 |