Highly conductive nanometer-thick gold films grown on molybdenum disulfide surfaces for interconnect applications

• Published in: Scientific reports Vol. 10; no. 1; p. 14463
• Main Authors: Zhang, Yu-Wei, Wu, Bo-Yu, Chen, Kuan-Chao, Wu, Chao-Hsin, Lin, Shih-Yen
• Format: Journal Article
• Language: English
• Published: London Nature Publishing Group UK 02.09.2020; Nature Publishing Group
• Subjects: 639/301/1005/1007; 639/301/357/995; Cancer therapies; Clinical trials; Deoxyribonucleic acid; DNA; DNA fingerprinting; DNA sequencing; Drug resistance; Feasibility studies; Genetic screening; Humanities and Social Sciences; Lung cancer; multidisciplinary; Mutation; Patients; Science; Science (multidisciplinary)
• ISSN: 2045-2322; 2045-2322
• DOI: 10.1038/s41598-020-71520-x

Thin gold (Au) films (10 nm) are deposited on different substrates by using a e-beam deposition system. Compared with sapphire and SiO 2 surfaces, longer migration length of the Au adatoms is observed on MoS 2 surfaces, which helps in the formation of a single-crystal Au film on the MoS 2 surface at 200 °C. The results have demonstrated that with the assistance of van der Waals epitaxy growth mode, single-crystal 3D metals can be grown on 2D material surfaces. With the improved crystalline quality and less significant Au grain coalescence on MoS 2 surfaces, sheet resistance 2.9 Ω/sq is obtained for the thin 10 nm Au film at 100 °C, which is the lowest value reported in literature. The highly conductive thin metal film is advantageous for the application of backend interconnects for the electronic devices with reduced line widths.