A UHV-compatible photoelectron emission microscope for applications in surface science

A three-stage electrostatic photoelectron emission microscope (PEEM) for use as an attachment on a UHV surface analysis chamber is described. The PEEM is intended for surface studies with lateral resolution of the order of μm where the real-time observation of processes is important.

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Bibliographic Details
Published inUltramicroscopy Vol. 36; no. 1; pp. 148 - 153
Main Authors Engel, W., Kordesch, M.E., Rotermund, H.H., Kubala, S., von Oertzen, A.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.05.1991
Elsevier Science
Subjects
Electron, positron and ion microscopes, electron diffractometers and related techniques
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
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Summary:A three-stage electrostatic photoelectron emission microscope (PEEM) for use as an attachment on a UHV surface analysis chamber is described. The PEEM is intended for surface studies with lateral resolution of the order of μm where the real-time observation of processes is important.
ISSN:0304-3991
1879-2723
DOI:10.1016/0304-3991(91)90146-W