Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating
In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that...
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Published in | Journal of micromechanics and microengineering Vol. 16; no. 10; pp. 1967 - 1974 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
01.10.2006
Institute of Physics |
Subjects | |
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Abstract | In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that utilizes high-quality nickel stamps with micron features down to sub-100 nm, made using proton beam writing coupled with nickel sulfamate electroplating. The fabricated stamps have a high aspect ratio, with smooth and vertical sidewalls. Nanoindentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness of 5 GPa and a sidewall roughness of 7 nm. The stamps have been used for nanoimprint lithography on polymethylmethacrylate (PMMA) substrates and the imprinted patterns show a high degree of reproducibility. |
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AbstractList | In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that utilizes high-quality nickel stamps with micron features down to sub-100 nm, made using proton beam writing coupled with nickel sulfamate electroplating. The fabricated stamps have a high aspect ratio, with smooth and vertical sidewalls. Nanoindentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness of 5 GPa and a sidewall roughness of 7 nm. The stamps have been used for nanoimprint lithography on polymethylmethacrylate (PMMA) substrates and the imprinted patterns show a high degree of reproducibility. |
Author | Watt, Frank Ansari, Kambiz van Kan, Jeroen Anton Bettiol, Andrew Anthony |
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Cites_doi | 10.1080/01418610210134422 10.1116/1.588604 10.1021/nl052478c 10.1016/j.nimb.2005.01.083 10.1063/1.114851 10.1038/376581a0 10.1016/S0013-4686(01)00576-X 10.1016/S0167-9317(02)00577-4 10.1116/1.1515305 10.1116/1.590934 10.1016/S0013-4686(01)00578-3 10.1016/S1359-6454(01)00245-2 10.1007/s005420050100 10.1088/0957-4484/13/5/309 10.1063/1.1604468 10.1007/978-1-4615-3482-2 10.1116/1.1319821 10.1016/j.nimb.2005.01.084 10.1016/S0168-583X(01)00360-3 10.1117/12.482750 |
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Keywords | Atomic force microscopy Embossing Lithography Nanoindentation Roughness Nanostructures Rough surfaces Hardness Indentation Microhardness PMMA Electrodeposition Nickel High aspect ratio microstructure HARM Nanotechnology Proton beams Production process |
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References | 11 12 Ross R B (21) 1992 23 13 van Kan J A (15) 2004 24 14 Lowenheim F (22) 1978 16 17 18 19 Taniguchi J (4) 2002; 13 Maximov I (6) 2002; 449 1 2 3 Li M T (5) 2003 7 8 9 20 10 |
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SubjectTerms | Applied sciences Cross-disciplinary physics: materials science; rheology Electronics Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Materials science Mechanical engineering. Machine design Mechanical instruments, equipment and techniques Methods of nanofabrication Microelectronic fabrication (materials and surfaces technology) Micromechanical devices and systems Nanolithography Physics Precision engineering, watch making Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
Title | Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating |
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