Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating

• Published in: Journal of micromechanics and microengineering Vol. 16; no. 10; pp. 1967 - 1974
• Main Authors: Ansari, Kambiz, van Kan, Jeroen Anton, Bettiol, Andrew Anthony, Watt, Frank
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 01.10.2006; Institute of Physics
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Electronics; Exact sciences and technology; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Materials science; Mechanical engineering. Machine design; Mechanical instruments, equipment and techniques; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Micromechanical devices and systems; Nanolithography; Physics; Precision engineering, watch making; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Atomic force microscopy; Embossing; Lithography; Nanoindentation; Roughness; Nanostructures; Rough surfaces; Hardness; Indentation; Microhardness; PMMA; Electrodeposition; Nickel; High aspect ratio microstructure HARM; Nanotechnology; Proton beams; Production process
• ISSN: 0960-1317; 1361-6439
• DOI: 10.1088/0960-1317/16/10/008

In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that utilizes high-quality nickel stamps with micron features down to sub-100 nm, made using proton beam writing coupled with nickel sulfamate electroplating. The fabricated stamps have a high aspect ratio, with smooth and vertical sidewalls. Nanoindentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness of 5 GPa and a sidewall roughness of 7 nm. The stamps have been used for nanoimprint lithography on polymethylmethacrylate (PMMA) substrates and the imprinted patterns show a high degree of reproducibility.