Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating
In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that...
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Published in | Journal of micromechanics and microengineering Vol. 16; no. 10; pp. 1967 - 1974 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
01.10.2006
Institute of Physics |
Subjects | |
Online Access | Get full text |
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Summary: | In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that utilizes high-quality nickel stamps with micron features down to sub-100 nm, made using proton beam writing coupled with nickel sulfamate electroplating. The fabricated stamps have a high aspect ratio, with smooth and vertical sidewalls. Nanoindentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness of 5 GPa and a sidewall roughness of 7 nm. The stamps have been used for nanoimprint lithography on polymethylmethacrylate (PMMA) substrates and the imprinted patterns show a high degree of reproducibility. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0960-1317 1361-6439 |
DOI: | 10.1088/0960-1317/16/10/008 |