Etch properties of resists modified by sequential infiltration synthesis

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Bibliographic Details
Published inJournal of vacuum science and technology. B, Nanotechnology & microelectronics Vol. 29; no. 6; p. 6
Main Authors Tseng, Yu-Chih, Peng, Qing, Ocola, Leonidas E., Czaplewski, David A., Elam, Jeffrey W., Darling, Seth B.
Format Journal Article
LanguageEnglish
Published 01.11.2011
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ISSN:2166-2746
2166-2754
DOI:10.1116/1.3640758