Nanostructured nickel oxide films prepared by chemical vapor deposition and their electrochromic properties

• Published in: Journal of nanoscience and nanotechnology Vol. 8; no. 5; p. 2703
• Main Authors: Vargas Garcia, J R, Lazcano Ugalde, E M, Hernandez Santiago, F, Hallen Lopez, J M
• Format: Journal Article
• Language: English
• Published: United States 01.05.2008
• ISSN: 1533-4880
• DOI: 10.1166/jnn.2008.563

The influence of the deposition conditions on the structural features and electrochromic properties of nickel oxide (NiO) films prepared by chemical vapor deposition has been investigated. NiO films have been prepared on fluorine doped tin oxide (FTO) coated glass substrates from nickel-acetylacetonate precursor and their electrochromic properties have been studied by cyclic voltammetry in a 0.1 M KOH solution at room temperature. Films exhibiting only the NiO phase were obtained at deposition temperatures higher than 450 degrees C in a wide range of reactor pressures (0.13 to 66.6 kPa). Particularly, NiO films prepared at 500-550 degrees C from 0.13 to 53.3 kPa are transparent in nature and exhibit a crystallite size varying from 10 to 60 nm. An appreciable anodic electrochromic change from transparent to black coloured resulted from a very porous surface morphology and film thickness of about 3.5 microm. The electrochromic change was maintained over 3000 switching cycles. Nanostructured 3.5 microm-thick NiO films showed a maximum difference in optical transmittance of about 40% in the near-infrared region. These results make the nanostructured NiO films comparables with those prepared by other deposition techniques.