Structural, Optical, and Thermoelectric Properties of the ZnO:Al Films Synthesized by Atomic Layer Deposition
Aluminum-doped zinc oxide thin films have been grown by atomic layer deposition at a temperature of 200°C. Using X-ray diffraction, it has been established that the ZnO:Al thin films exhibits the reflections from the (100), (002), (110), and (201) ZnO hexagonal phase planes. The (101) and (102) plan...
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Published in | Physics of the solid state Vol. 61; no. 10; pp. 1904 - 1909 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Moscow
Pleiades Publishing
01.10.2019
Springer Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | Aluminum-doped zinc oxide thin films have been grown by atomic layer deposition at a temperature of 200°C. Using X-ray diffraction, it has been established that the ZnO:Al thin films exhibits the reflections from the (100), (002), (110), and (201) ZnO hexagonal phase planes. The (101) and (102) planes have also been detected by electron diffraction. The ZnO:Al thin films grow smooth with a root-mean-square roughness of
R
q
= 0.33 nm and characteristic nanocrystallite sizes of ~70 and ~15 nm without additional aluminum or aluminum oxide phases. The transmission at a wavelength of 550 nm with regard to the substrate has been found to be 96%. The refractive indices and absorption coefficients of the ZnO:Al thin films in the wavelength range of 250–900 nm have been determined. The maximum refractive indices and absorption coefficients have been found to be 2.09 at a wavelength of 335 nm and 0.39 at a wavelength of 295 nm, respectively. The optical band gap is 3.56 eV. The resistivity, Seebeck coefficient, and power factor of the ZnO:Al thin films are ∼1.02 × 10
–3
Ω cm, –60 μV/K, and 340 μW m
–1
K
–2
at room temperature, respectively. The maximum power factor attains 620 μW m
–1
K
–2
at a temperature of 200°C. |
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ISSN: | 1063-7834 1090-6460 |
DOI: | 10.1134/S1063783419100354 |