Bai, S., Cao, M., Jin, Y., Dai, X., Liang, X., Ye, Z., . . . Zhang, F. (2014). Low-Temperature Combustion-Synthesized Nickel Oxide Thin Films as Hole-Transport Interlayers for Solution-Processed Optoelectronic Devices. Advanced energy materials, 4(6), np-n/a. https://doi.org/10.1002/aenm.201301460
Chicago Style (17th ed.) CitationBai, Sai, et al. "Low-Temperature Combustion-Synthesized Nickel Oxide Thin Films as Hole-Transport Interlayers for Solution-Processed Optoelectronic Devices." Advanced Energy Materials 4, no. 6 (2014): np-n/a. https://doi.org/10.1002/aenm.201301460.
MLA (9th ed.) CitationBai, Sai, et al. "Low-Temperature Combustion-Synthesized Nickel Oxide Thin Films as Hole-Transport Interlayers for Solution-Processed Optoelectronic Devices." Advanced Energy Materials, vol. 4, no. 6, 2014, pp. np-n/a, https://doi.org/10.1002/aenm.201301460.