Structure and morphology optimization of poly(3-hexylthiophene) thin films onto silanized silicon oxide
[Display omitted] ► Structure/morphology of differently prepared P3HT films by GIXD and AFM techniques. ► Differences in crystallinity and orientation between surface and bulk in the films. ► Determination of optimal preparation conditions in terms of orientation/structure. The influence of the prep...
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Published in | European polymer journal Vol. 48; no. 6; pp. 1050 - 1061 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Kidlington
Elsevier Ltd
01.06.2012
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | [Display omitted]
► Structure/morphology of differently prepared P3HT films by GIXD and AFM techniques. ► Differences in crystallinity and orientation between surface and bulk in the films. ► Determination of optimal preparation conditions in terms of orientation/structure.
The influence of the preparation conditions, including substrate functionalization with common silanizers, onto structure/morphology of the overlying poly(3-hexylthiophene) thin films has been investigated by using both grazing incidence X-ray diffraction and atomic force microscopy. The factors determining the formation of spin-coated films suitable for applications in field effect transistors, i.e. concentration, spin-speed, and thermal treatment are addressed. We have established, by a tuning of the preparation and post-deposition treatments, the optimal conditions to get films with the required structural/morphologic features. Moreover we have shown that the macromolecules orient and organize at the interface zone (⩽10nm from the interface) better than in the upper layers, i.e. far away from the interface. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0014-3057 1873-1945 |
DOI: | 10.1016/j.eurpolymj.2012.03.019 |