Structure and morphology optimization of poly(3-hexylthiophene) thin films onto silanized silicon oxide

[Display omitted] ► Structure/morphology of differently prepared P3HT films by GIXD and AFM techniques. ► Differences in crystallinity and orientation between surface and bulk in the films. ► Determination of optimal preparation conditions in terms of orientation/structure. The influence of the prep...

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Published inEuropean polymer journal Vol. 48; no. 6; pp. 1050 - 1061
Main Authors Scavia, G., Barba, L., Arrighetti, G., Milita, S., Porzio, W.
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier Ltd 01.06.2012
Elsevier
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Summary:[Display omitted] ► Structure/morphology of differently prepared P3HT films by GIXD and AFM techniques. ► Differences in crystallinity and orientation between surface and bulk in the films. ► Determination of optimal preparation conditions in terms of orientation/structure. The influence of the preparation conditions, including substrate functionalization with common silanizers, onto structure/morphology of the overlying poly(3-hexylthiophene) thin films has been investigated by using both grazing incidence X-ray diffraction and atomic force microscopy. The factors determining the formation of spin-coated films suitable for applications in field effect transistors, i.e. concentration, spin-speed, and thermal treatment are addressed. We have established, by a tuning of the preparation and post-deposition treatments, the optimal conditions to get films with the required structural/morphologic features. Moreover we have shown that the macromolecules orient and organize at the interface zone (⩽10nm from the interface) better than in the upper layers, i.e. far away from the interface.
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content type line 23
ISSN:0014-3057
1873-1945
DOI:10.1016/j.eurpolymj.2012.03.019