Structural and Secondary Electron Yield Properties of Titanium-Palladium Films with Laser-Treated Copper Substrate for Application in Neutron Generators

Secondary electron emission (SEE) of the oxygen-free high-conductivity copper (OFHC) target surface in neutron generators limits the stability and improvement of the neutron yield. A novel-type target of titanium-palladium films coated on laser-treated OFHC target substrate was proposed and explored...

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Published inMaterials Vol. 14; no. 5; p. 1222
Main Authors Gao, Yong, Wang, Sheng, Wang, Jie, You, Zhiming, Zhang, Jing, Hu, Yaocheng, Wu, Yue, Fan, Jiakun, Li, Haipeng, Zhan, Qin, Yang, Hongguang, Xu, Zhanglian
Format Journal Article
LanguageEnglish
Published Switzerland MDPI 05.03.2021
MDPI AG
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Summary:Secondary electron emission (SEE) of the oxygen-free high-conductivity copper (OFHC) target surface in neutron generators limits the stability and improvement of the neutron yield. A novel-type target of titanium-palladium films coated on laser-treated OFHC target substrate was proposed and explored in this work to obtain low secondary electron yield (SEY) without introducing any components. The combination of Ti-Pd films and laser-treated OFHC substrate can effectively suppress secondary electron emission and enhance the adsorption ability to hydrogen isotopes with the existence of Pd film. The surface morphologies, surface chemical states, and SEYs of Ti-Pd films with laser-treated OFHC substrate were studied systematically for the first time. The XPS results showed that the laser-treated OFHC substrate surface was basically covered by Pd film. However, the Pd film surface was partially oxidized, with percentages of 21.31 and 10.02% for PdO and PdO , respectively. The SEYs of Ti-Pd films with laser-treated OFHC substrate were all below 1 within the investigated primary energy range of 100-3000 eV, which would be sufficient for application in neutron generators. Specifically, the maximum SEY ( ) of laser-treated OFHC substrate coated by Ti-Pd films was 0.87 with corresponding incident electron energy of 400 eV.
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ISSN:1996-1944
1996-1944
DOI:10.3390/ma14051222