Accessing new magnetic regimes by tuning the ligand spin-orbit coupling in van der Waals magnets

Van der Waals (VdW) materials have opened new directions in the study of low dimensional magnetism. A largely unexplored arena is the intrinsic tuning of VdW magnets toward new ground states. Chromium trihalides provided the first such example with a change of interlayer magnetic coupling emerging u...

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Bibliographic Details
Published inScience advances Vol. 6; no. 30; p. eabb9379
Main Authors Tartaglia, Thomas A, Tang, Joseph N, Lado, Jose L, Bahrami, Faranak, Abramchuk, Mykola, McCandless, Gregory T, Doyle, Meaghan C, Burch, Kenneth S, Ran, Ying, Chan, Julia Y, Tafti, Fazel
Format Journal Article
LanguageEnglish
Published United States American Association for the Advancement of Science (AAAS) 24.07.2020
American Association for the Advancement of Science
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Summary:Van der Waals (VdW) materials have opened new directions in the study of low dimensional magnetism. A largely unexplored arena is the intrinsic tuning of VdW magnets toward new ground states. Chromium trihalides provided the first such example with a change of interlayer magnetic coupling emerging upon exfoliation. Here, we take a different approach to engineer previously unknown ground states, not by exfoliation, but by tuning the spin-orbit coupling (SOC) of the nonmagnetic ligand atoms (Cl, Br, I). We synthesize a three-halide series, CrCl Br I , and map their magnetic properties as a function of Cl, Br, and I content. The resulting triangular phase diagrams unveil a frustrated regime near CrCl . First-principles calculations confirm that the frustration is driven by a competition between the chromium and halide SOCs. Furthermore, we reveal a field-induced change of interlayer coupling in the bulk of CrCl Br I crystals at the same field as in the exfoliation experiments.
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SC0018675; DMR-1708929; DMR-1700030; DMR-1712128
USDOE
National Science Foundation (NSF)
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division
ISSN:2375-2548
2375-2548
DOI:10.1126/sciadv.abb9379