A Semi-Floating Gate Transistor for Low-Voltage Ultrafast Memory and Sensing Operation
As the semiconductor devices of integrated circuits approach the physical limitations of scaling, alternative transistor and memory designs are needed to achieve improvements in speed, density, and power consumption. We report on a transistor that uses an embedded tunneling field-effect transistor f...
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Published in | Science (American Association for the Advancement of Science) Vol. 341; no. 6146; pp. 640 - 643 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Washington, DC
American Association for the Advancement of Science
09.08.2013
The American Association for the Advancement of Science |
Subjects | |
Online Access | Get full text |
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Summary: | As the semiconductor devices of integrated circuits approach the physical limitations of scaling, alternative transistor and memory designs are needed to achieve improvements in speed, density, and power consumption. We report on a transistor that uses an embedded tunneling field-effect transistor for charging and discharging the semi-floating gate. This transistor operates at low voltages (≤2.0 volts), with a large threshold voltage window of 3.1 volts, and can achieve ultra—high-speed writing operations (on time scales of ∼1 nanosecond). A linear dependence of drain current on light intensity was observed when the transistor was exposed to light, so possible applications include image sensing with high density and performance. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0036-8075 1095-9203 |
DOI: | 10.1126/science.1240961 |