Incorporation and critical concentration of oxygen in a-Si:H solar cells
For different process conditions, series of hydrogenated amorphous silicon p-i-n solar cells with various oxygen concentrations in the intrinsic absorber layer were fabricated by plasma-enhanced chemical vapor deposition at 13.56 MHz using process gas mixtures of SiH 4 and H 2. Oxygen was introduced...
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Published in | Solar energy materials and solar cells Vol. 95; no. 10; pp. 2811 - 2815 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.10.2011
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | For different process conditions, series of hydrogenated amorphous silicon p-i-n solar cells with various oxygen concentrations in the intrinsic absorber layer were fabricated by plasma-enhanced chemical vapor deposition at 13.56
MHz using process gas mixtures of SiH
4 and H
2. Oxygen was introduced into the gas phase during the deposition process by a controllable leak in the chamber wall and the amount of oxygen supply is characterized by the oxygen base pressure
p
b
. It is found that for a certain deposition regime defined by silane and H
2 flows, deposition pressure and substrate temperature the oxygen incorporation follows an expected dependence on the ratio
p
b
/
r
d
with
r
d
the deposition rate. This relation is not valid for the comparison of different deposition regimes. A high hydrogen flow is found to reduce the oxygen incorporation strongly. The photovoltaic parameters of the solar cells were measured in the initial state as well as after 1000
h of light-soaking. The critical oxygen concentration (i.e. the upper limit of incorporated oxygen not leading to a decay of the solar cell performance) was determined for each regime in the initial and light-soaked state. For all deposition regimes, the results show no difference in these critical oxygen concentrations for the initial and light-soaked state. The critical oxygen concentration, is found to differ for the different process regimes and turns out to be the highest (approximately 1×10
20
cm
−3) for the deposition regime with the highest hydrogen flow rate, which interestingly is the regime with the lowest oxygen incorporation at a given
p
b
/
r
d
ratio. This combination makes the regime of high hydrogen gas flow suitable for depositing high-efficiency solar cells at high base pressure.
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► The critical oxygen concentration is unaffected by light-induced-degradation. ► High process gas flows lead to high critical oxygen concentrations. ► High process gas flows lead to a low incorporation ratio. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0927-0248 1879-3398 |
DOI: | 10.1016/j.solmat.2011.05.035 |