Micromachined array-type Mirau interferometer for parallel inspection of MEMS

• Published in: Journal of micromechanics and microengineering Vol. 21; no. 6; p. 065005
• Main Authors: Albero, J, Bargiel, S, Passilly, N, Dannberg, P, Stumpf, M, Zeitner, U D, Rousselot, C, Gastinger, K, Gorecki, C
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 01.06.2011; Institute of Physics
• Subjects: Applied sciences; Circuit properties; Electric, optical and optoelectronic circuits; Electronics; Engineering Sciences; Exact sciences and technology; Instrumentation and Detectors; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Integrated optics. Optical fibers and wave guides; Mechanical instruments, equipment and techniques; Micro and nanotechnologies; Microelectronic fabrication (materials and surfaces technology); Microelectronics; Micromechanical devices and systems; Optical and optoelectronic circuits; Physics; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Testing, measurement, noise and reliability; Integrated optics; Light interferometry; White light; Optical coherence tomography; Measurement sensor; Micromachining; Glass; Micro-optics; Mirau interferometer; Optical arrays; Quality control; Assembling; Microlenses; Spherical aberration; Microelectromechanical device; Micromirrors; Metering; Production process
• ISSN: 0960-1317; 1361-6439
• DOI: 10.1088/0960-1317/21/6/065005

We present the development of an array type of micromachined Mirau interferometers, operating in the regime of low coherence interferometry (LCI) and adapted for massively parallel inspection of MEMS. The system is a combination of free-space micro-optical technologies and silicon micromachining, based on the vertical assembly of two glass wafers. The probing wafer carries an array of refractive microlenses, diffractive gratings to correct chromatic and spherical aberrations and reference micro-mirrors. The semitransparent beam splitter plate is based on the deposition of a dielectric multilayer, sandwiched between two glass wafers. The interferometer matrix is the key element of a novel inspection system aimed to perform parallel inspection of MEMS. The fabricated demonstrator, including 5 x 5 channels, allows consequently decreasing the measurement time by a factor of 25. In the following, the details of fabrication processes of the micro-optical components and their assembly are described. The feasibility of the LCI is demonstrated for the measurement of a wafer of MEMS sensors.