740-nm emission from InGaN-based LEDs on c-plane sapphire substrates by MOVPE

We have realized for the first time deep-red emission from InGaN-based light-emitting diodes on c-plane sapphire substrates grown by metalorganic vapor-phase epitaxy. The peak wavelength was 740nm by continuous current injection, in spite of a wide full-width at half-maximum. Indium incorporation wa...

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Bibliographic Details
Published inJournal of crystal growth Vol. 343; no. 1; pp. 13 - 16
Main Authors Ohkawa, Kazuhiro, Watanabe, Tomomasa, Sakamoto, Masanori, Hirako, Akira, Deura, Momoko
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 15.03.2012
Elsevier
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Summary:We have realized for the first time deep-red emission from InGaN-based light-emitting diodes on c-plane sapphire substrates grown by metalorganic vapor-phase epitaxy. The peak wavelength was 740nm by continuous current injection, in spite of a wide full-width at half-maximum. Indium incorporation was enhanced by a smaller distance of the opposing wall of the reactor from the susceptor, which resulted in raising the gas temperature. In addition, a higher number of quantum wells led to the relaxation of InGaN well layers and thus enhanced indium incorporation. ► We realized deep-red emission from InGaN-based LEDs on c-plane sapphire substrates. ► The electroluminescence peak wavelength was 740nm, in spite of a wide FWHM. ► Indium incorporation was enhanced by a smaller distance of the reactor. ► A number of quantum wells led to the relaxation of InGaN wells and higher In content.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2011.12.075