Migration of Dislocations in Strained GaN Heteroepitaxial Layers

Transmission electron microscopy has been used to study the relaxation of misfit strains in GaN/Al0.28Ga0.72N layers grown on (0001) sapphire. It has been observed that threading edge‐type dislocations migrate laterally in the top GaN layer to form misfit dislocations. This leads to reactions with o...

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Published inPhysica status solidi. B. Basic research Vol. 234; no. 3; pp. 952 - 955
Main Authors Sahonta, S.-L., Baines, M.Q., Cherns, D., Amano, H., Ponce, F.A.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Berlin WILEY-VCH Verlag 01.12.2002
WILEY‐VCH Verlag
Wiley
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Summary:Transmission electron microscopy has been used to study the relaxation of misfit strains in GaN/Al0.28Ga0.72N layers grown on (0001) sapphire. It has been observed that threading edge‐type dislocations migrate laterally in the top GaN layer to form misfit dislocations. This leads to reactions with other threading dislocations, to generate either closed loops or more complex nodes, which reduce the total threading dislocation density. The proportion of edge‐type dislocations compared to screw‐type and mixed dislocations is reduced with increasing GaN thickness. It is proposed that the lateral migration of the dislocations is predominantly by a climb rather than a glide mechanism.
Bibliography:istex:5238DC9BF5021B5DF3DC440FAFE6094B504C0359
ark:/67375/WNG-RRHP6D5J-7
ArticleID:PSSB952
ISSN:0370-1972
1521-3951
DOI:10.1002/1521-3951(200212)234:3<952::AID-PSSB952>3.0.CO;2-4