Transparent conductive characteristics of Ti:ITO films deposited by RF magnetron sputtering at low substrate temperature
Transparent conductive metal oxide films of titanium-doped indium–tin-oxide (Ti:ITO) and indium-tin-oxide (ITO) were deposited by a dual target type radio frequency (RF) magnetron sputtering, and the films were applied to dye-sensitized solar cells (DSCs). Electrical and optical properties of the fi...
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Published in | Surface & coatings technology Vol. 205; pp. S210 - S215 |
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Main Authors | , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
25.12.2010
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Transparent conductive metal oxide films of titanium-doped indium–tin-oxide (Ti:ITO) and indium-tin-oxide (ITO) were deposited by a dual target type radio frequency (RF) magnetron sputtering, and the films were applied to dye-sensitized solar cells (DSCs). Electrical and optical properties of the films were investigated as well as the film structure and morphology. At an annealing temperature of 450
°C, the resistivity of the Ti:ITO and ITO films are about 5
×
10
4 and 1.1
×
10
3
Ωcm, and the transmittances of both films at a wavelength of 550
nm reach about 85–90%. The impedance in the Ti:ITO-based DSC sample is 31.9, 49.6, and 20.2, for the counter electrode, the TiO
2/dye/electrolyte interface, and the carrier transport by ions within the electrolyte, respectively. The series resistance,
R
s
, is about 72.4
Ω. Photoconversion efficiency (
η) in the Ti:ITO-based DSC sample is 3.75% (
ff: 0.54,
V
oc
: 0.71
V,
J
sc
: 9.82
mA/cm
2) at 100
mW/cm
2 light intensity. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2010.07.094 |