Transparent conductive characteristics of Ti:ITO films deposited by RF magnetron sputtering at low substrate temperature

Transparent conductive metal oxide films of titanium-doped indium–tin-oxide (Ti:ITO) and indium-tin-oxide (ITO) were deposited by a dual target type radio frequency (RF) magnetron sputtering, and the films were applied to dye-sensitized solar cells (DSCs). Electrical and optical properties of the fi...

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Bibliographic Details
Published inSurface & coatings technology Vol. 205; pp. S210 - S215
Main Authors Paeng, Sung-Hwan, Park, Min-Woo, Sung, Youl-Moon
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 25.12.2010
Elsevier
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Summary:Transparent conductive metal oxide films of titanium-doped indium–tin-oxide (Ti:ITO) and indium-tin-oxide (ITO) were deposited by a dual target type radio frequency (RF) magnetron sputtering, and the films were applied to dye-sensitized solar cells (DSCs). Electrical and optical properties of the films were investigated as well as the film structure and morphology. At an annealing temperature of 450 °C, the resistivity of the Ti:ITO and ITO films are about 5 × 10 4 and 1.1 × 10 3 Ωcm, and the transmittances of both films at a wavelength of 550 nm reach about 85–90%. The impedance in the Ti:ITO-based DSC sample is 31.9, 49.6, and 20.2, for the counter electrode, the TiO 2/dye/electrolyte interface, and the carrier transport by ions within the electrolyte, respectively. The series resistance, R s , is about 72.4 Ω. Photoconversion efficiency ( η) in the Ti:ITO-based DSC sample is 3.75% ( ff: 0.54, V oc : 0.71 V, J sc : 9.82 mA/cm 2) at 100 mW/cm 2 light intensity.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2010.07.094