Interface fracture properties of thin films studied by using the micro-cantilever deflection technique

The mechanical behavior of interfaces between silicon oxide and metallic thin films is investigated using an alternative approach which is based on the miniaturized cantilever deflection technique (Weihs et al., 1988 [1]). The critical energy release rates for three different silicon oxide/metal sys...

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Bibliographic Details
Published inSurface & coatings technology Vol. 204; no. 6; pp. 878 - 881
Main Authors Matoy, Kurt, Detzel, Thomas, Müller, Matthias, Motz, Christian, Dehm, Gerhard
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 25.12.2009
Elsevier
Subjects
Applied sciences
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Fractures
Interface toughness
Ion beam processing
Materials science
Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology
Metals. Metallurgy
Methods of deposition of films and coatings; film growth and epitaxy
Micro-cantilever
Physics
Surface treatments
Ion beam processing
Micro-cantilever
Interface toughness
Thin films
Interfaces
Ruptures
Ion beam
Mechanical properties
Surface treatments
Fracture toughness
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Summary:The mechanical behavior of interfaces between silicon oxide and metallic thin films is investigated using an alternative approach which is based on the miniaturized cantilever deflection technique (Weihs et al., 1988 [1]). The critical energy release rates for three different silicon oxide/metal systems are determined and the results are discussed in this paper. The technique suggested may be applicable with high spatial resolution for a wide variety of structured thin film systems.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2009.09.013