When epitaxy meets plasma: a path to ordered nanosheets arrays

The possibility of a controlled assembly of 2-dimensional (2D) nanosheets (NSs) into ordered arrays or even more sophisticated structures offers tremendous opportunities in the context of fabrication of a variety of NSs based devices. Reports of such ordered NSs are rare and all conventional “top-do...

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Published inScientific reports Vol. 3; no. 1; p. 2427
Main Authors Zhuang, Hao, Zhang, Lei, Fuchs, Regina, Staedler, Thorsten, Jiang, Xin
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 13.08.2013
Nature Publishing Group
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Abstract The possibility of a controlled assembly of 2-dimensional (2D) nanosheets (NSs) into ordered arrays or even more sophisticated structures offers tremendous opportunities in the context of fabrication of a variety of NSs based devices. Reports of such ordered NSs are rare and all conventional “top-down” methods typically led to coarse structures exhibiting only limited surface quality. In this work, we demonstrate a path to directly synthesis ordered NSs arrays in a plasma activated chemical vapor deposition technique utilizing planar defects formed during hetero-epitaxial growth of crystals featuring a close-packed lattice. As an example, the synthesis of 3C-SiC NSs arrays with well-defined orientation on (001) and (111) Si substrates is shown. A detailed analysis identifies planar defects and the plasma environment as key factors determining the resulting 2D NSs arrays. Consequently, a “planar defects induced selective growth” effect is proposed to elucidate the corresponding growth mechanism.
AbstractList The possibility of a controlled assembly of 2-dimensional (2D) nanosheets (NSs) into ordered arrays or even more sophisticated structures offers tremendous opportunities in the context of fabrication of a variety of NSs based devices. Reports of such ordered NSs are rare and all conventional "top-down" methods typically led to coarse structures exhibiting only limited surface quality. In this work, we demonstrate a path to directly synthesis ordered NSs arrays in a plasma activated chemical vapor deposition technique utilizing planar defects formed during hetero-epitaxial growth of crystals featuring a close-packed lattice. As an example, the synthesis of 3C-SiC NSs arrays with well-defined orientation on (001) and (111) Si substrates is shown. A detailed analysis identifies planar defects and the plasma environment as key factors determining the resulting 2D NSs arrays. Consequently, a "planar defects induced selective growth" effect is proposed to elucidate the corresponding growth mechanism.The possibility of a controlled assembly of 2-dimensional (2D) nanosheets (NSs) into ordered arrays or even more sophisticated structures offers tremendous opportunities in the context of fabrication of a variety of NSs based devices. Reports of such ordered NSs are rare and all conventional "top-down" methods typically led to coarse structures exhibiting only limited surface quality. In this work, we demonstrate a path to directly synthesis ordered NSs arrays in a plasma activated chemical vapor deposition technique utilizing planar defects formed during hetero-epitaxial growth of crystals featuring a close-packed lattice. As an example, the synthesis of 3C-SiC NSs arrays with well-defined orientation on (001) and (111) Si substrates is shown. A detailed analysis identifies planar defects and the plasma environment as key factors determining the resulting 2D NSs arrays. Consequently, a "planar defects induced selective growth" effect is proposed to elucidate the corresponding growth mechanism.
The possibility of a controlled assembly of 2-dimensional (2D) nanosheets (NSs) into ordered arrays or even more sophisticated structures offers tremendous opportunities in the context of fabrication of a variety of NSs based devices. Reports of such ordered NSs are rare and all conventional "top-down" methods typically led to coarse structures exhibiting only limited surface quality. In this work, we demonstrate a path to directly synthesis ordered NSs arrays in a plasma activated chemical vapor deposition technique utilizing planar defects formed during hetero-epitaxial growth of crystals featuring a close-packed lattice. As an example, the synthesis of 3C-SiC NSs arrays with well-defined orientation on (001) and (111) Si substrates is shown. A detailed analysis identifies planar defects and the plasma environment as key factors determining the resulting 2D NSs arrays. Consequently, a "planar defects induced selective growth" effect is proposed to elucidate the corresponding growth mechanism.
ArticleNumber 2427
Author Fuchs, Regina
Jiang, Xin
Zhang, Lei
Zhuang, Hao
Staedler, Thorsten
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  givenname: Regina
  surname: Fuchs
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Snippet The possibility of a controlled assembly of 2-dimensional (2D) nanosheets (NSs) into ordered arrays or even more sophisticated structures offers tremendous...
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SubjectTerms 639/301/357/1018
639/301/930/1032
639/766/94
639/925/357/1018
Crystallization - methods
Crystals
Defects
Fabrication
Humanities and Social Sciences
Materials Testing
multidisciplinary
Nanoparticles - chemistry
Nanoparticles - ultrastructure
Particle Size
Plasma Gases - chemistry
Science
Surface Properties
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Title When epitaxy meets plasma: a path to ordered nanosheets arrays
URI https://link.springer.com/article/10.1038/srep02427
https://www.ncbi.nlm.nih.gov/pubmed/23939624
https://www.proquest.com/docview/1897440250
https://www.proquest.com/docview/1420616108
https://pubmed.ncbi.nlm.nih.gov/PMC3741627
Volume 3
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