Electrowetting on superhydrophobic SU-8 patterned surfaces

Electrowetting on micro-patterned layers of SU-8 photoresist with an amorphous Teflon ® coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias. However, this does not apply below 40 V and we suggest that this ma...

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Bibliographic Details
Published inSensors and actuators. A. Physical. Vol. 130; pp. 189 - 193
Main Authors Herbertson, Dale L., Evans, Carl R., Shirtcliffe, Neil J., McHale, Glen, Newton, Michael I.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 14.08.2006
Subjects
Cassie-Baxter
Electrowetting
SU-8
Superhydrophobic
Wenzel
Electrowetting
Wenzel
Superhydrophobic
SU-8
Cassie-Baxter
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Summary:Electrowetting on micro-patterned layers of SU-8 photoresist with an amorphous Teflon ® coating has been observed. The cosine of the contact angle is shown to be proportional to the square of the applied voltage for increasing bias. However, this does not apply below 40 V and we suggest that this may be explained in terms of penetration of fluid into the pattern of the surface. Assuming that the initial application of a bias voltage converts the drop from Cassie-Baxter to Wenzel regime, we have used this as a technique to estimate the roughness factor of the surface.
Bibliography:SourceType-Scholarly Journals-2
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ISSN:0924-4247
1873-3069
DOI:10.1016/j.sna.2005.12.018