Nanomaterials Aspects for Photocatalysis as Potential for the Inactivation of COVID-19 Virus

Coronavirus disease-2019 is caused by severe acute respiratory syndrome coronavirus 2 (SARS-CoV-2) and is the most difficult recent global outbreak. Semiconducting materials can be used as effective photocatalysts in photoactive technology by generating various reactive oxidative species (ROS), incl...

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Bibliographic Details
Published inCatalysts Vol. 13; no. 3; p. 620
Main Authors Bagheri, Samira, Julkapli, Nurhidayatullaili Muhd, Yusof Hamid, Mohd Rashid, Ziaei, Rojin, Sagadevan, Suresh
Format Journal Article
LanguageEnglish
Published Basel MDPI AG 01.03.2023
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Summary:Coronavirus disease-2019 is caused by severe acute respiratory syndrome coronavirus 2 (SARS-CoV-2) and is the most difficult recent global outbreak. Semiconducting materials can be used as effective photocatalysts in photoactive technology by generating various reactive oxidative species (ROS), including superoxide (•O2−) and hydroxyl (•OH) radicals, either by degradation of proteins, DNA, and RNA or by inhibition of cell development through terminating the cellular membrane. This review emphasizes the capability of photocatalysis as a reliable, economical, and fast-preferred method with high chemical and thermal stability for the deactivation and degradation of SARS-CoV-2. The light-generated holes present in the valence band (VB) have strong oxidizing properties, which result in the oxidation of surface proteins and their inactivation under light illumination. In addition, this review discusses the most recent photocatalytic systems, including metals, metal oxides, carbonaceous nanomaterials, and 2-dimensional advanced structures, for efficient SARS-CoV-2 inactivation using different photocatalytic experimental parameters. Finally, this review article summarizes the limitations of these photocatalytic approaches and provides recommendations for preserving the antiviral properties of photocatalysts, large-scale treatment, green sustainable treatment, and reducing the overall expenditure for applications.
ISSN:2073-4344
2073-4344
DOI:10.3390/catal13030620