Interstitial solid solution Hf5GaxSn3 (x=0–1)

► Formation of an interstitial solid solution Hf5GaxSn3 (x=0–1) based on the binary compound Hf5Sn3 was established at 600°C. ► The Ga atoms occupy [Hf6] octahedral interstices (Wyckoff position 2b) up to the composition Hf5GaSn3, which represents a Hf5CuSn3-type structure (ordered derivative of Ti5...

Full description

Saved in:
Bibliographic Details
Published inJournal of alloys and compounds Vol. 512; no. 1; pp. 246 - 251
Main Authors Voznyak, I., Tokaychuk, Ya, Hlukhyy, V., Fässler, T.F., Gladyshevskii, R.
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier B.V 25.01.2012
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:► Formation of an interstitial solid solution Hf5GaxSn3 (x=0–1) based on the binary compound Hf5Sn3 was established at 600°C. ► The Ga atoms occupy [Hf6] octahedral interstices (Wyckoff position 2b) up to the composition Hf5GaSn3, which represents a Hf5CuSn3-type structure (ordered derivative of Ti5Ga4). ► The cell parameters and cell volume increase with increasing gallium content. ► The coordination number of the hafnium atoms in Wyckoff position 6g is reduced from 15 (Hf1Sn5Hf10 for Hf5Sn3) to 11 (Hf1Sn5Ga2Hf4 for Hf5GaSn3). Formation of an interstitial solid solution Hf5GaxSn3 (x=0–1) based on the binary compound Hf5Sn3 (structure type Mn5Si3, Pearson symbol hP16, space group P63/mcm, a=8.36562(6), c=5.70775(4)Å from X-ray powder diffraction) was established at 600°C. The crystal structure (structure type Hf5CuSn3, ordered derivative of Ti5Ga4, hP18, P63/mcm) was refined on X-ray single-crystal diffraction data for three compositions: Hf5Ga0.16(3)Sn3 (a=8.3288(12), c=5.6988(11)Å), Hf5Ga0.53(2)Sn3 (a=8.4205(12), c=5.7655(12)Å) and Hf5GaSn3 (a=8.5564(12), c=5.7859(12)Å). The Ga atoms occupy Wyckoff position 2b at the centres of Hf6 octahedral interstices.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2011.09.075