Laterally organized carbon nanotube arrays based on hot-filament chemical vapor deposition

• Published in: Thin solid films Vol. 519; no. 14; pp. 4598 - 4602
• Main Authors: Kim, Ki-Hwan, Lefeuvre, Emmanuel, Châtelet, Marc, Pribat, Didier, Cojocaru, Costel Sorin
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 02.05.2011; Elsevier
• Subjects: Aluminum oxide; Anodic; Arrays; Carbon; Carbon nanotubes; Chemical vapor deposition; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed Matter; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Filaments; Hot-filament chemical vapor deposition; Materials Science; Methane; Methods of deposition of films and coatings; film growth and epitaxy; Methods of nanofabrication; Nanoscale materials and structures: fabrication and characterization; Nanotubes; Other topics in nanoscale materials and structures; Physics; Porous anodic alumina; Carbon nanotubes; Porous anodic alumina; Hot-filament chemical vapor deposition; Hot filament chemical vapor deposition; Methane; Aluminium oxide; Porous materials; Template reaction; Etching; Carbon; Precursor; Gas mixtures; CVD; Acrylic acid polymer; Growth mechanism; Arrays; Alumina; Nanostructured materials; Nanomaterial synthesis; Porous anodic alumina Carbon nanotubes Hot-filament chemical vapor deposition
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2011.01.334

Lateral porous anodic alumina (PAA) templates were used to organize carbon nanotubes (CNTs) grown by a hot-filament assisted chemical vapor deposition (HFCVD) process. For the CNT growth, we used a modified “home-made” HFCVD system with two independently powered filaments which are fitted respectively on the methane (CH 4) gas line, which serves as a carbon precursor and on the hydrogen (H 2) gas line, which acts as an etching agent for the parasitic amorphous carbon. Various activation powers of the hot filaments were used to directly or indirectly decompose the gas mixtures at relatively low substrate temperatures. A parametric study of the HFCVD process has been carried out for optimizing the confined CNTs growth inside the lateral PAA templates.