Micromachined planar inductors on silicon wafers for MEMS applications

This paper describes three micromachined planar inductors (a spiral type, a solenoid type, and a toroidal meander type) with electroplated nickel-iron permalloy cores which have been realized on a silicon wafer using micromachining techniques. The electrical properties among the fabricated inductors...

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Bibliographic Details
Published inIEEE transactions on industrial electronics (1982) Vol. 45; no. 6; pp. 866 - 876
Main Authors Ahn, C.H., Allen, M.G.
Format Journal Article
LanguageEnglish
Published IEEE 01.12.1998
Subjects
Fabrication
Inductors
Magnetic cores
Magnetic flux density
Magnetic properties
Micromachining
Micromechanical devices
Silicon
Solenoids
Spirals
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Summary:This paper describes three micromachined planar inductors (a spiral type, a solenoid type, and a toroidal meander type) with electroplated nickel-iron permalloy cores which have been realized on a silicon wafer using micromachining techniques. The electrical properties among the fabricated inductors are compared and the related fabrication issues are discussed, with emphasis on the low-temperature CMOS-compatible process, the high current-carrying capacity, the high magnetic flux density, the closed magnetic circuits, and the low product cost. The micromachined on-chip inductors can be applied for magnetic microelectromechanical systems devices, such as micromotors, microactuators, microsensors, and integrated power converters, which envisages new micropower magnetics on a chip with integrated circuits.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
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ISSN:0278-0046
1557-9948
DOI:10.1109/41.735330