SU-8 as a structural material for labs-on-chips and microelectromechanical systems

• Published in: Electrophoresis Vol. 28; no. 24; pp. 4539 - 4551
• Main Authors: Abgrall, Patrick, Conedera, Veronique, Camon, Henri, Gue, Anne-Marie, Nguyen, Nam-Trung
• Format: Journal Article
• Language: English
• Published: Weinheim Wiley-VCH Verlag 01.12.2007; WILEY-VCH Verlag; WILEY‐VCH Verlag
• Subjects: Electrochemistry - instrumentation; Lab-on-chip; Microelectromechanical systems; Microscopy, Electron, Scanning; Microtechnologies; Miniaturization; Nanotechnology; SU-8; Surface Properties
• ISSN: 0173-0835; 1522-2683
• DOI: 10.1002/elps.200700333

Since its introduction in the nineties, the negative resist SU-8 has been increasingly used in micro- and nanotechnologies. SU-8 has made the fabrication of high-aspect ratio structures accessible to labs with no high-end facilities such as X-ray lithography systems or deep reactive ion etching systems. These low-cost techniques have been applied not only in the fabrication of metallic parts or molds, but also in numerous other micromachining processes. Its ease of use has made SU-8 to be used in many applications, even when high-aspect ratios are not required. Beyond these pattern transfer applications, SU-8 has been used directly as a structural material for microelectromechanical systems and microfluidics due to its properties such as its excellent chemical resistance or the low Young modulus. In contrast to conventional resists, which are used temporally, SU-8 has been used as a permanent building material to fabricate microcomponents such as cantilevers, membranes, and microchannels. SU-8-based techniques have led to new low-temperature processes suitable for the fabrication of a wide range of objects, from the single component to the complete lab-on-chip. First, this article aims to review the different techniques and provides guidelines to the use of SU-8 as a structural material. Second, practical examples from our respective labs are presented.