Preparation and properties of erbium oxide films deposited by radio frequency magnetron sputtering

• Published in: Applied surface science Vol. 307; pp. 615 - 620
• Main Authors: Wu, Yanping, Zhu, Shengfa, Liu, Tianwei, Li, Fangfang, Zhang, Yanzhi, Rao, Yongchu, Zhang, Yongbin
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 15.07.2014; Elsevier
• Subjects: Compressive properties; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Deposition; Erbium oxide; Erbium oxide films; Exact sciences and technology; Magnetron sputtering; Penetration; Permeation; Physics; Radio frequencies; Radio frequency magnetron sputtering; Residual stress; Tritium permeation barrier; Erbium oxide films; Tritium permeation barrier; Radio frequency magnetron sputtering; Magnetrons; Cathode sputtering; Rare earths; Preparation; Permeation; Erbium; Film growth
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2014.04.086

•The residual stress of Er2O3 film deposited at different temperature was investigated for the first time.•The residual stress transformed from tensile to compressive stress as Er2O3 film gets thicker.•The (222) preferential orientation of Er2O3 depressed, when the substrate temperature was above 200°C.•The permeation reduced factor (PRF) of 0.5-mm Er2O3 film deposited at room temperature is about 300 at the 773K. The erbium oxide (Er2O3) film is considered as a candidate for tritium permeation barrier in recent years because of its low permeation reduced ratio and easy accessibility. Erbium oxide films with different thickness were prepared by radio frequency magnetron sputtering with varying substrate temperature and sputtering time. The film surface morphology, structure, residual stress and deuterium permeation behavior were investigated. The films were compact and smooth, while the thickness varied from 200nm to 1000nm. The (222) preferential orientation of Er2O3 depressed, when the substrate temperature above 200°C. With the substrate temperature increasing from RT to 200°C, the compressive stress became larger, and it converted into tensile stress deposited at 400°C. The residual stress transformed from tensile to compressive stress as the film got thicker. The permeation flux of the sample deposited with Er2O3 film was 2 orders of magnitude less than that of uncoated one. The permeation reduced factor (PRF) of 0.5-μm Er2O3 film deposited at room temperature is about 300 at 773K.