Design and fabrication of micro-cube-corner array retro-reflectors

A novel approach of modeling and analyzing the two types of micro-cube-corner array retro-reflectors is proposed. Light tracing algorithm for determining the maximum incident angle range limited by the critical angle of total reflection, and reverse-projection (RP) algorithm for calculating the avai...

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Bibliographic Details
Published inOptics communications Vol. 209; no. 1; pp. 75 - 83
Main Authors Yuan, Jinghe, Chang, Shengjiang, Li, Sumei, Zhang, Yanxin
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.08.2002
Elsevier Science
Subjects
Continuous deep relief technology (CDRT)
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Moving mask technology (MMT)
Optical elements, devices, and systems
Optics
Physics
Retro-reflection
Reverse-projection (RP) algorithm
Reverse-projection (RP) algorithm
Moving mask technology (MMT)
Continuous deep relief technology (CDRT)
Retro-reflection
Design
Manufacturing processes
Algorithms
Theoretical study
Total reflection
Masks
Retroreflector
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Summary:A novel approach of modeling and analyzing the two types of micro-cube-corner array retro-reflectors is proposed. Light tracing algorithm for determining the maximum incident angle range limited by the critical angle of total reflection, and reverse-projection (RP) algorithm for calculating the available area of an isolated unit are described. Simulation results and fabrication method of micro-cube-corner array by moving-mask technique are also given.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0030-4018
1873-0310
DOI:10.1016/S0030-4018(02)01630-9