Fine neurite patterns from photocrosslinking of cell-repellent benzophenone copolymer

• Published in: Journal of neuroscience methods Vol. 210; no. 2; pp. 161 - 168
• Main Authors: Baek, Nam Seob, Kim, Yong Hee, Han, Young Hwan, Offenhäusser, Andreas, Chung, Myung-Ae, Jung, Sang-Don
• Format: Journal Article
• Language: English
• Published: Netherlands Elsevier B.V 30.09.2012
• Subjects: Animals; Benzophenones - pharmacology; Cell Movement - physiology; Cell-repellent pattern; Cells, Cultured; Cerebral Cortex - cytology; Embryo, Mammalian; Neurites - physiology; Neurons - cytology; Neurons - drug effects; Neurons - metabolism; Patterned neuronal networks; Photocrosslinking; Photosensitizing Agents; Polylysine - chemistry; Polymers - chemistry; Primary neuronal culture; Rats; Rats, Sprague-Dawley; Spectrometry, Fluorescence; Tubulin - metabolism; Ultraviolet Rays; Patterned neuronal networks; Cell-repellent pattern; Primary neuronal culture; Photocrosslinking
• ISSN: 0165-0270; 1872-678X
• DOI: 10.1016/j.jneumeth.2012.07.011

[Display omitted] ► Synthesis of benzophenone copolymer and photopattering of cell-repellent patterns. ► Fine neurite, presumably axon, patterns with excellent pattern fidelity were obtained. ► Benzophenone unit was UV-cross-linked without photo-oxidative damage to poly-d-lysine. We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ∼77mW/cm2 at 280nm and ∼60mW/cm2 at 365nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine.