Structure and optoelectronic properties of multi-element oxide thin film

► The (ZnSnCuTiNb) 1 − x O x films are all of amorphous without any multi-phase structure. ► By controlling the oxygen content which changes electron binding energy of the cations, we can alter the electrical and optical properties of the films. ► The (ZnSnCuTiNb) 1 − x O x films possess the charact...

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Published inApplied surface science Vol. 257; no. 14; pp. 6073 - 6078
Main Authors Yu, Ruei-Sung, Huang, Chueh-Jung, Huang, Rong-Hsin, Sun, Chung-Hsing, Shieu, Fuh-Sheng
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.05.2011
Elsevier
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Summary:► The (ZnSnCuTiNb) 1 − x O x films are all of amorphous without any multi-phase structure. ► By controlling the oxygen content which changes electron binding energy of the cations, we can alter the electrical and optical properties of the films. ► The (ZnSnCuTiNb) 1 − x O x films possess the characteristics of optoelectronic semiconductor whose oxygen content are 51.6 and 56 atom%. ► These films have carrier concentrations of 2.62 × 10 20 and 1.37 × 10 17 cm −3, and conductivities ( σ) of 57.2 and 9.45 × 10 −3 (Ω cm) −1, and indirect band gaps of 1.69 and 2.26 eV, respectively. This paper focuses on analyzing structural and optoelectronic properties of (ZnSnCuTiNb) 1 − x O x films. The results of XRD and HRTEM indicate that the (ZnSnCuTiNb) 1 − x O x films are all of amorphous without any multi-phase structure. XPS analysis confirms that the increase of the oxygen content makes the cations electron binding energy higher, suggesting the removal of valence electrons or the extent of oxidation can change the optoelectronic properties of the films. The (ZnSnCuTiNb) 1 − x O x films possess the characteristics of optoelectronic semiconductor whose oxygen content are 51.6 and 56 atom%. These films have carrier concentrations of 2.62 × 10 20 and 1.37 × 10 17 cm −3, and conductivities ( σ) of 57.2 and 9.45 × 10 −3 (Ω cm) −1, and indirect band gaps of 1.69 and 2.26 eV, respectively. They are n-type oxide semiconductors.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2011.01.139