Thin films of iron oxide by low pressure MOCVD using a novel precursor: tris( t-butyl-3-oxo-butanoato)iron(III)
Deposition of thin films of iron oxide on glass has been carried out using a novel precursor, tris( t-butyl-3-oxo-butanoato)iron(III), in a low-pressure metalorganic chemical vapor deposition (MOCVD) system. The new precursor was characterized for its thermal properties by thermogravimetry and diffe...
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Published in | Thin solid films Vol. 424; no. 1; pp. 56 - 60 |
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Main Authors | , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier B.V
01.01.2003
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | Deposition of thin films of iron oxide on glass has been carried out using a novel precursor, tris(
t-butyl-3-oxo-butanoato)iron(III), in a low-pressure metalorganic chemical vapor deposition (MOCVD) system. The new precursor was characterized for its thermal properties by thermogravimetry and differential thermal analysis. The films were characterized by X-ray diffraction (XRD), transmission electron microscopy, scanning electron microscopy, and by optical measurements. XRD studies reveal that films grown at substrate temperatures below ∼550 °C and at low oxygen flow rates comprise only the phase Fe
3O
4 (magnetite). At higher temperatures and at higher oxygen flow rates, an increasing proportion of α-Fe
2O
3 is formed along with Fe
3O
4. Films of magnetite grown under different reactive ambients—oxygen and nitrous oxide—have very different morphologies, as revealed by scanning electron microscopic studies. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/S0040-6090(02)00903-3 |