Thin films of iron oxide by low pressure MOCVD using a novel precursor: tris( t-butyl-3-oxo-butanoato)iron(III)

Deposition of thin films of iron oxide on glass has been carried out using a novel precursor, tris( t-butyl-3-oxo-butanoato)iron(III), in a low-pressure metalorganic chemical vapor deposition (MOCVD) system. The new precursor was characterized for its thermal properties by thermogravimetry and diffe...

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Bibliographic Details
Published inThin solid films Vol. 424; no. 1; pp. 56 - 60
Main Authors Shalini, K, Subbanna, G.N, Chandrasekaran, S, Shivashankar, S.A
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 01.01.2003
Elsevier Science
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Summary:Deposition of thin films of iron oxide on glass has been carried out using a novel precursor, tris( t-butyl-3-oxo-butanoato)iron(III), in a low-pressure metalorganic chemical vapor deposition (MOCVD) system. The new precursor was characterized for its thermal properties by thermogravimetry and differential thermal analysis. The films were characterized by X-ray diffraction (XRD), transmission electron microscopy, scanning electron microscopy, and by optical measurements. XRD studies reveal that films grown at substrate temperatures below ∼550 °C and at low oxygen flow rates comprise only the phase Fe 3O 4 (magnetite). At higher temperatures and at higher oxygen flow rates, an increasing proportion of α-Fe 2O 3 is formed along with Fe 3O 4. Films of magnetite grown under different reactive ambients—oxygen and nitrous oxide—have very different morphologies, as revealed by scanning electron microscopic studies.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(02)00903-3