Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD

An expanding thermal plasma created by a cascaded arc is used to deposit surface textured ZnO films. Films have been deposited at 150–350°C at a rate of typically 0.70 nm/s. They exhibit low resistivity (<10 −3 Ωcm), high transmittance in the visible wavelength region (>80%) and a rough surfac...

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Bibliographic Details
Published inThin solid films Vol. 392; no. 2; pp. 226 - 230
Main Authors Groenen, R, Löffler, J, Sommeling, P.M, Linden, J.L, Hamers, E.A.G, Schropp, R.E.I, van de Sanden, M.C.M
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 30.07.2001
Elsevier Science
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Summary:An expanding thermal plasma created by a cascaded arc is used to deposit surface textured ZnO films. Films have been deposited at 150–350°C at a rate of typically 0.70 nm/s. They exhibit low resistivity (<10 −3 Ωcm), high transmittance in the visible wavelength region (>80%) and a rough surface texture. The crystallite size and surface roughness increase with increasing deposition temperature and flow of argon ions. At the same time columnar textured growth gets less pronounced, a change to granular growth is observed. First p-i-n a-Si:H solar cells deposited on this material with initial efficiencies approaching 10% have been realised.
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ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(01)01032-X