Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD
An expanding thermal plasma created by a cascaded arc is used to deposit surface textured ZnO films. Films have been deposited at 150–350°C at a rate of typically 0.70 nm/s. They exhibit low resistivity (<10 −3 Ωcm), high transmittance in the visible wavelength region (>80%) and a rough surfac...
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Published in | Thin solid films Vol. 392; no. 2; pp. 226 - 230 |
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Main Authors | , , , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier B.V
30.07.2001
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | An expanding thermal plasma created by a cascaded arc is used to deposit surface textured ZnO films. Films have been deposited at 150–350°C at a rate of typically 0.70 nm/s. They exhibit low resistivity (<10
−3 Ωcm), high transmittance in the visible wavelength region (>80%) and a rough surface texture. The crystallite size and surface roughness increase with increasing deposition temperature and flow of argon ions. At the same time columnar textured growth gets less pronounced, a change to granular growth is observed. First p-i-n a-Si:H solar cells deposited on this material with initial efficiencies approaching 10% have been realised. |
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Bibliography: | SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3 |
ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/S0040-6090(01)01032-X |