Bismuth oxide thin films prepared by chemical bath deposition (CBD) method: annealing effect
Bismuth oxide thin films have been deposited by room temperature chemical bath deposition (CBD) method and annealed at 623K in air. They were characterized for structural, surface morphological, optical and electrical properties. From the X-ray diffraction patterns, it was found that after annealing...
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Published in | Applied surface science Vol. 250; no. 1-4; pp. 161 - 167 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
31.08.2005
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | Bismuth oxide thin films have been deposited by room temperature chemical bath deposition (CBD) method and annealed at 623K in air. They were characterized for structural, surface morphological, optical and electrical properties. From the X-ray diffraction patterns, it was found that after annealing a non-stoichiometric phase, Bi2O2.33, was removed and phase pure monoclinic Bi2O3 was obtained. Surface morphology of Bi2O3 film at lower magnification SEM showed rod-like structure, however, higher magnification showed a rectangular slice-like structure perpendicular to substrate, giving rise to microrods on the surface. The optical studies showed the decrease in band gap by 0.3eV after annealing. The electrical resistivity variation showed semiconductor behavior and from thermoemf measurements, the electrical conductivity was found to be of n-type. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2004.12.050 |