Low temperature poly-Si TFT-LCD by excimer laser anneal

Excimer laser anneal (ELA) has allowed the production of large-area poly-Si thin-film transistor liquid crystal displays (TFT-LCDs) on a glass substrate. The state of the art of large-area low-temperature TFT-LCDs is reported in this paper. High-performance poly-Si TFTs are expected to achieve vario...

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Bibliographic Details
Published inThin solid films Vol. 383; no. 1-2; pp. 19 - 24
Main Authors Uchikoga, Shuichi, Ibaraki, Nobuki
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 15.02.2001
Elsevier Science
Subjects
Applied sciences
Display
Electronics
Exact sciences and technology
Excimer laser
Liquid crystal display
Poly-Si
Thin-film transistor
Poly-Si
Thin-film transistor
Excimer laser
Liquid crystal display
Prospective
State of the art
Manufacturing process
Laser beam annealing
Liquid crystal displays
Excimer lasers
Thin film transistor
Application
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Summary:Excimer laser anneal (ELA) has allowed the production of large-area poly-Si thin-film transistor liquid crystal displays (TFT-LCDs) on a glass substrate. The state of the art of large-area low-temperature TFT-LCDs is reported in this paper. High-performance poly-Si TFTs are expected to achieve various applications such as system-on-glass where various functions are added on to the display. Possible applications and future trends are discussed together with the technologies required to achieve this goal.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(00)01644-8